Deposition Processes with Hardcore Behaviour

Sputter deposition processes

Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...

Dioxins and furans in air and deposition: a review of levels, behaviour and processes.

This paper is a comprehensive, critical review of the levels, behaviour and processes affecting polychlorinated dibenzo-p-dioxins and -furans (PCDD/Fs) in air and deposition. Aspects of sampling, analysis and quality assurance/control are discussed initially, before a review of the PCDD/F concentrations in ambient air is presented. The general trend in sigma P4-8 CDD/F (and sigma TEQ) is: remot...

Gibbs Delaunay tessellations with geometric hardcore conditions

Universal OWF and Hardcore predicates

Proof: The proof of this lemma uses a technique called as Padding which has has its roots in complexity theory. Let fk : {0, 1} → {0, 1} be one-way. From the property of one-way functions (efficient evaluation) there exists a specific polynomial p(·) such that for all k ∈ N, fk can be evaluated in time p(n(k)). We now define a function gk : {0, 1} → {0, 1}m(k)+p(n(k))−n(k) such that gk(x||w) = ...

Studying chemical vapor deposition processes with theoretical chemistry